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A New, Simple Two-Pass Masking Approach for Streaking Artifact Removal in Any QSM Pipeline

Author:Anita Karsa  Karin Shmueli  

Session Type:Digital Poster  

Session Date:Wednesday, 11 May 2022  

Topic:Module 16: Diffusion  

Session Name:Susceptibility II  

Program Number:2462  

Room Session:Exhibition Hall:S8 & S9  

Institution:University College London